Hydrophilic copolymers and their use in reprography

C - Chemistry – Metallurgy – 08 – F

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C08F 220/04 (2006.01) B41N 1/12 (2006.01) B41N 3/03 (2006.01) C08F 220/06 (2006.01) C08F 220/10 (2006.01) C08F 220/34 (2006.01)

Patent

CA 2047483

Abstract of the Disclosure The invention relates to a hydrophilic copolymer having the general structure: Image in which R1 denotes H, CH3 or C2H5, R2 denotes an alkyl or cycloalkyl radical having 1 to 17 carbon atoms, R3 denotes CH3, C2H5 or C3H7, m is 2, 3 or 4 and n, o, p denote the fractions of the monomer units having acidic side groups, neutral, non-ionizable monomer units and monomer units having basic side groups respectively, in mol%, with n + o + p = 100 mol%, with the proviso that n and p are each ? 5 mol%, wherein the copolymer is a linear copolymer having a random structure of monomer units. The copolymer is useful as a hydrophilizing agent for lithographic and offset printing plates.

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