C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/271.5, 260/2
C07D 491/052 (2006.01) C07D 491/04 (2006.01) C07D 491/16 (2006.01)
Patent
CA 1134363
Abstract of the disclosure: Pyrano-heterocycles of the formula Image in which R1 represent hydrogen or an alkyl radical contain- ing up to 4 carbon atoms; R2 represents hydrogen or an al- kyl, alkoxy or haloalkyl radical each having up to 3 car- bon atoms, or halogen; or R1 and R2 together form an ethy- lene or propylene group, and R3 and R4, independently of each other, are hydrogen or alkyl or alkoxy radicals each of which groups containing up to 3 carbon atoms, which may be unsubstituted or substituted totally or partially with halogen atoms, halogen or alkoxycarbonyl having up to 3 carbon atoms in the alkyl group and R5 represents a nitro group or hydrogen, their physiologically tolerated salts, processes for preparing these compounds and medicaments containing these compounds.
334066
Alpermann Hans G.
Gebert Ulrich
Kammerer Friedrich-Johannes
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Hoechst Aktiengesellschaft
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