Method and apparatus for pattern examination

Details Method and apparatus for pattern examination Method and apparatus for pattern examination

G - Physics

06

K

354/57

G06K 11/00 (2006.01) G01B 11/02 (2006.01) G03F 7/20 (2006.01)

Patent

CA 1102001

ABSTRACT OF THE DISCLOSURE A pattern to he examined is scanned to produce binary information of divisional regions of the pattern cor- responding to the picture elements of respective scanning lines as parallel information. The parallel information regarding the shape and position of the pattern is concurrently examined under two modes. The second mode includes examination of the vertical edge and the horizontal edge, examination of the ver- tical and horizontal edges by compensating the deviation of mask setting in the horizontal direction, and examination of the vertical and horizontal edges by compensating the deviation of mask setting in the vertical direction.

324495

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