High temperature polymers and photographic elements...

Details High temperature polymers and photographic elements... High temperature polymers and photographic elements...

C - Chemistry, Metallurgy

08

G

96/172, 402/234

C08G 69/26 (2006.01) C08G 69/32 (2006.01) C08G 69/42 (2006.01) G03C 1/76 (2006.01) G03C 1/795 (2006.01)

Patent

CA 1074045

Abstract of Disclosure High temperature-resistant polyamides are derived from alkyl substituted aminophenylindanamines and dicarboxylic acids or their derivatives. Film formed from the polyamides are useful in photographic elements, particularly as supports in photographic elements. -1-

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