C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/308.5
C07D 277/32 (2006.01) C07D 277/20 (2006.01) C07D 277/34 (2006.01) C07D 277/40 (2006.01) C07D 277/46 (2006.01) C07D 277/48 (2006.01) C07D 417/12 (2006.01)
Patent
CA 1137492
A B S T R A C T The present invention relates to novel thiazolylacetic acid compounds of the formula: Image [V] wherein R1 represents amino or hydroxyl group which may be protected, and B represents Image - or Image where1n R2 represents amino or hydroxyl group which may be protected and R5 represents hydroxyl group which may be protected, or a salt, an ester or a reactive derivative thereof, and to processes for preparing these compounds. The novel thiazolylacetic acid compounds (V) are useful intermediary compounds for preparation of cephem compounds.
315026
Aki Osami
Kawakita Kenji
Matsushita Yoshihiro
Morimoto Akira
Ochiai Michihiko
Fetherstonhaugh & Co.
Takeda Chemical Industries Ltd.
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