Photosensitive polymers

Details Photosensitive polymers Photosensitive polymers

C - Chemistry, Metallurgy

08

G

402/191, 402/253

C08G 65/32 (2006.01) C08F 299/04 (2006.01) C08G 63/21 (2006.01) C08G 63/58 (2006.01)

Patent

CA 1101149

Abstract of the Disclosure A novel class of photosensitive polymers are disclosed which are prepared by the reaction, preferably in the presence of a catalyst, of a reactive polymer, a halogenated cyclic anhy- dride and glycidyl ester of an alpha, beta-unsaturated carboxylic acid. These polymers are capable of undergoing vinyl-type polv- merization when exposed to actinic radiation. * * * -1-

270165

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