Photosensitive block copolymer composition and elements

Details Photosensitive block copolymer composition and elements Photosensitive block copolymer composition and elements

C - Chemistry, Metallurgy

08

L

96/179, 400/3047

C08L 53/02 (2006.01) G03C 11/22 (2006.01) G03F 7/032 (2006.01) G03F 7/033 (2006.01)

Patent

CA 1099435

TITLE PHOTOSENSITIVE BLOCK COPOLYMER COMPOSITION AND ELEMENTS ABSTRACT OF THE DISCLOSURE Photosensitive compositions, and elements made therefrom, comprising a solvent-soluble, thermoplastic, elastomeric, block copolymer, a nongaseous ethylenically unsaturated compound, and an addition polymerization initiator activatable by actinic light are useful in preparing printing plates, particularly flexographic printing plates, and other relief images.

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