Method for the glow-discharge-activated reactive deposition...

Details Method for the glow-discharge-activated reactive deposition... Method for the glow-discharge-activated reactive deposition...

C - Chemistry, Metallurgy

23

C

316/38

C23C 16/50 (2006.01) C23C 16/04 (2006.01) C23C 16/509 (2006.01)

Patent

CA 1258089

17 ABSTRACT "Method for the glow discharge-activated reactive deposition of electrically conductive material from a gas phase." For the reactive deposition of tubular bodies of electrically conductive material from a flowing gas phase on a tubular substrate (1) a glow discharge 11 is produced between an inner electrode 6 and an outer electrode 2 one of which is constructed so as to be tubular and serves as a substrate. It is ensured that the electrodes 2, 6 are not short-circuited by growing conductive surface layers so that the glow discharge 11 extinguishes. Furthermore, the electrically conductive coating on the electrode 6 not functioning as the substrate electrode is interrupted in an insulating manner to limit the glow discharge 11 locally. For example by a gas barrier the deposit of an electrically conducting deposit on the insulation can be avoided. The glow discharge 11 is reciprocated during the deposition process. Figure 1.

508098

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