Process for the production of images

Details Process for the production of images Process for the production of images

G - Physics

03

F

96/222

G03F 7/16 (2006.01) G03F 7/004 (2006.01) G03F 7/023 (2006.01) H05K 3/06 (2006.01)

Patent

CA 1271660

Case 3-14785/1+2/=/ARL 346 PROCESS FOR THE PRODUCTION OF IMAGES ABSTRACT A positive photoresist is electrodeposited onto a substrate, exposed to actinic radiation in a predetermined pattern, and then exposed areas are removed by contact with a developer. When the substrate is a metal-faced laminate, the exposed metal surface may be etched and the residual electrodeposited layer removed by contact with a suitable solvent, optionally after a second, general, exposure to actinic radiation. Suitable electrodepositable positive photoresists include o-nitrocarbinol esters and o-nitrophenyl acetals, their polyesters and end-capped derivatives and quinone diazide sulphonyl esters of phenolic novolaks,having salt-forming groups in the molecule, especially carboxylic acid and amine groups. The process is suitable for the production of printing plates and printed circuits, especially circuits on both sides of a laminate sheet linked conductively through metal-lined holes in the sheet.

475738

Affiliated with

Also associated with

Rating

Process for the production of images does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the production of images, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the production of images will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1170152