C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
167/280, 260/579
C07C 323/22 (2006.01) A61K 31/10 (2006.01) A61K 31/12 (2006.01)
Patent
CA 1320498
ABSTRACT This invention relates to compounds of the formula: Image wherein R1 and R2 are the same or different members of the group consisting of 1,1-dimethylethyl, halo, phenyl or sub- stituted phenyl; Alk is a lower alkylene; and R3 is hydrogen or lower alkyl; with the limitation that R1 each must be the same and R2 each must be the same, which are useful as anti-inflammatory and anti-allergy agents.
615884
Mueller Richard A.
Osler Hoskin & Harcourt Llp
Searle (g. D.) & Co.
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