Shared current loop, multiple field apparatus and process...

Details Shared current loop, multiple field apparatus and process... Shared current loop, multiple field apparatus and process...

H - Electricity

01

L

353/17, 358/25,

H01L 21/203 (2006.01) H01J 37/34 (2006.01)

Patent

CA 1282840

SHARED CURRENT LOOP, MULTIPLE FIELD APPARATUS AND PROCESS FOR PLASMA PROCESSING ABSTRACT A shared current loop, multiple field apparatus and process for magnetron gas discharge processing is disclosed. The apparatus includes an evacuable chamber for containing a reactant gas. A multi-part cathode associated with a current loop generates multiple, inde- pendent electrical fields. The cathode comprises a first cathode portion for generating a first electric field that forms a gas discharge including ions. The second cathode portion generates a second, independent electric field. The second electric field extracts ions from the gas discharge, and may also control the energy with which the extracted ions strike an item to be pro- cessed. Each cathode portion is electrically insulated from the other and may be connected to a separate power source.

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