Automatic variable rate evaporation source for thin film...

Details Automatic variable rate evaporation source for thin film... Automatic variable rate evaporation source for thin film...

B - Operations, Transporting

05

C

32/2

B05C 11/10 (2006.01) B05C 3/109 (2006.01) C23C 14/22 (2006.01) C23C 14/54 (2006.01)

Patent

CA 1185782

TITLE AUTOMATIC VARIABLE RATE EVAPORATION SOURCE FOR THIN FILM DEPOSITION INVENTOR Germain Boivin ABSTRACT OF THE DISCLOSURE An apparatus for automatically controlling the rate of vacuum deposition of thin films on a substrate, consisting of an optical diaphragm or shutter in the form of two apertured plates placed between the evaporation crucible and a substrate which are moved in opposite directions to vary the size of the opening through which the evaporated material must pass to be deposited on the substrate. The rate of evaporation is sensed by a quartz crystal and this signal is compared to a reference signal. The difference between the two signals is used to control the movement of the apertured plates thereby correcting the rate of deposition of the thin film.

420009

Affiliated with

Also associated with

Rating

Automatic variable rate evaporation source for thin film... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Automatic variable rate evaporation source for thin film..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Automatic variable rate evaporation source for thin film... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1172516