C - Chemistry – Metallurgy – 07 – K
Patent
C - Chemistry, Metallurgy
07
K
530/13, 167/319,
C07K 7/04 (2006.01) A61L 27/36 (2006.01) C02F 1/50 (2006.01) C02F 5/12 (2006.01) C02F 5/14 (2006.01) C07K 7/08 (2006.01) C07K 14/00 (2006.01)
Patent
CA 1318986
Abstract A poly-amino acid compound capable of inhibiting mineral deposition, which has the structure: poly (X)n poly (Y)m where each X is a residue independently selected from the group consisting of aspartic acid, glutamic acid, phosphoserine, phosphohomoserine, phosphotyrosine, and phosphothreonine, each Y is independently a residue selected from the group consisting of alanine, leucine, isoleucine, valine and glycine, n is 2 to 60, m is 2 to 60, and n + m 2 5, and wherein poly (X)n may contain up to 10% of the Y residues and poly (Y)m may contain up to 10% of the X residues, and salts thereof.
575405
Sikes C. Steven
Wheeler Alfred P.
Norton Rose Or S.e.n.c.r.l. S.r.l./llp
University Of South Alabama
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