Plasma pinch system and method of using same

Details Plasma pinch system and method of using same Plasma pinch system and method of using same

H - Electricity

01

L

356/147, 356/192

H01L 21/268 (2006.01) G03F 7/20 (2006.01) H01J 61/72 (2006.01) H05H 1/04 (2006.01) H05H 1/52 (2006.01)

Patent

CA 1307356

PLASMA PINCH SYSTEM AND METHOD OF USING SAME Abstract of the Disclosure A plasma pinch system includes a fluid-jet pinch device for establishing a plasma source composed of a tenuous vapor preconditioning cloud surrounding a central narrow flowing find stream of fluid under pressure. A discharge device is connected electrically to the fluid- jet pinch device for supplying an electrical flow through a portion of the fluid stream for establishing an incoherent light emitting plasma therealong. A method of using the plasma pinch system for manufacturing semiconductors, includes exposing a semiconductor wafer to the incoherent light emitted by the plasma for either annealing or etching purposes.

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