C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/104.3
C07D 501/36 (2006.01) C07D 213/55 (2006.01) C07D 333/24 (2006.01)
Patent
CA 1074298
ABSTRACT Compounds of the formula Image wherein R1 is hydrogen, lower alkyl, cycloalkyl, cycloalkenyl, cycloalkadienyl, phenyl, phenyl-lower alkyl substituted phenyl and phenyl-lower alkyl and certain heterocyclic groups; R2 is hydrogen or lower alkyl; R3 is hydrogen, lower alkyl, phenyl- lower alkyl, substituted phenyl-lower alkyl, diphenyl-lower alkyl, tri(lower alkyl)stannyl, tri(lower alkyl)silyl, a salt forming ion, or the group Image wherein R is lower alkyl, phenyl, phenyl-lower alkyl, or substituted phenyl and phenyl- lower alky; and R4 represents certain heterocyclic groups are disclosed. These compounds are useful as antibacterial agents.
234462
Breuer Hermann
Treuner Uwe D.
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