C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/207, 260/251
C07D 213/16 (2006.01) C07D 239/26 (2006.01) C07D 307/36 (2006.01) C07D 333/08 (2006.01)
Patent
CA 1316534
RAN 4060/141 Abstract The compounds of the general formula Image I wherein X and Y represent -CH2- or >C(CH3)2; Z represents a residue -CHR8-, >CO, >CR8OR7, -CHR8-CHR8-, -CHOR7-CH2-, -CO-CHOR7- or -CHOR7-CHOR7-; R1 represents a 5- or 6-membered, monocyclic heterocyclic residue which can be C-substituted by halogen, lower-alkyl, lower-alkoxy, acyloxy, nitro, hydroxy, amino, lower-alkylamino or di-lower-alkylamino and/or which can be substituted on a ring -NH- group by lower-alkyl: R2 and R3 represent hydrogen, lower-alkyl, trifluoromethyl or halogen and one of the residues R2 and R3 represents trifluoromethyl or lower-alkyl: R4 and R5 represent hydrogen, alkyl, alkoxy or halogen: R6 represents hydrogen, lower-alkyl or a residue -OR7; R7 represents hydrogen, lower-alkyl or acyl: R8 represents hydrogen or lower-alkyl: and several residues R7 or R8 present can be different from one another, can be used as medicaments, e.g. for the treatment of neoplasms or dermatoses. The compounds can be manufactured from a corresponding bicyclic component and a heterocyclic component containing the residue R1 by a Wittig, Horner or Grignard reaction and optional subequent transformation of reactive groups.
538691
Klaus Michael
Weiss Ekkehard
F. Hoffmann-La Roche Ag
Gowling Lafleur Henderson Llp
LandOfFree
Tetrahydronaphthaline and indane derivatives does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Tetrahydronaphthaline and indane derivatives, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Tetrahydronaphthaline and indane derivatives will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1189458