H - Electricity – 01 – L
Patent
H - Electricity
01
L
356/125
H01L 29/16 (2006.01) H01L 21/265 (2006.01) H01L 27/092 (2006.01) H01L 29/08 (2006.01) H01L 29/167 (2006.01)
Patent
CA 1226965
ABSTRACT The tendency of a CMOS circuit to latch up is reduced by implanting ions of germanium or tin into the source and drain regions of the circuit. The low energy gap of these ions lowers the band gap of the source and drain regions, which in turn inhi- bits their ability to inject tarriers into the substrate and well.
490092
Fairchild Camera And Instrument Corporation
Smart & Biggar
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