Precleaning substrate and lamination of photosensitive layer...

Details Precleaning substrate and lamination of photosensitive layer... Precleaning substrate and lamination of photosensitive layer...

G - Physics

03

F

154/41

G03F 7/16 (2006.01) B32B 37/22 (2006.01) B32B 38/00 (2006.01)

Patent

CA 1168139

ABSTRACT In a process for laminating a photosensitive layer to a substrate surface by means of nip rolls, the improvement comprising the sequential steps of: (a) rendering the substrate surface clean, as defined by the uniform water film test; (b) within about 1 minute after rendering the substrate clean and immediately prior to lamination, applying a thin layer of liquid to form an interface between the substrate surface and the photosensitive layer; and (c) displacing the thin layer of liquid from the interface by absorption into the photosensitive layer during lamination.

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