C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/292, 260/353
C07D 317/58 (2006.01) C07C 29/147 (2006.01) C07C 33/48 (2006.01) C07C 43/225 (2006.01) C07C 43/23 (2006.01) C07D 209/48 (2006.01)
Patent
CA 1187500
(1) Compounds of the formula: Image wherein: R is 3,4-methylenedioxyphenyl; phenyl; phenyl monosubstituted, disubstituted, or trisubstituted by (C1-C8)alkyl, (C1-C8)alkoxy, (C1-C6)alkyl- carbonyloxy, hydroxy, chlorine, bromine, iodine, fluorine, trifluoromethyl, nitro, (C1-C6)alkyl- carbonyl, benzoyl, or phenyl; 1- or 2-naphthyl; 1-, 2-, or 3-indenyl; 1-, 2-, or 9-fluorenyl; 2- pyridinyl; 1-, 2-, or 3-piperidinyl; 2- or 3- pyrrolyl; 2- or 3-thienyl; 2- or 3-furanyl; 2- or 3-indolyl; 2- or 3-thianaphthenyl; or 2- or 3- benzofuranyl; R1 is hydrogen, (C1-C8)alkyl, benzyl, or phenethyl; X and Y, independently, are hydrogen, fluorine, chlorine, or bromine; and A is a divalent radical of the formula: Image wherein R is hydrogen, methyl, or ethyl, and m and n, independently, are an (2) ABSTRACT: integer from 0 to 4, provided that m + n cannot be greater than 4; -(CH2)p-D-(CH2)q-, wherein D is oxygen or sulfur, p is an integer from 2 to 4, and q is an integer from 0 to 2 provided that p + q cannot be greater than 4; or -(CH2)rCH=CH(CH2)s-, wherein r is an integer from 1 to 3 and s is an integer from 0 to 2, provided that r + s cannot be greater than 3; or a non-toxic pharmaceutically acceptable acid addition salt thereof; provided that when each of X and Y in Formula I or hydrogen, R cannot be phenyl; are MAO inhibitors useful for treating depression. Processes and intermediates for preparing the compounds of Formula I or II are also described.
403943
Merrell Toraude Et Compagnie
Osler Hoskin & Harcourt Llp
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