C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/469, 260/604
C07C 215/20 (2006.01) C07C 271/16 (2006.01)
Patent
CA 1307289
ABSTRACT OF THE DISCLOSURE The present application discloses compounds of formula: Image wherein R is lower alkyl, cycloalkylmethyl or benzyl; R' is H, loweralkyl, vinyl or arylalkyl; P2 and P3 are independently selected from H or an O-protecting group; and P1 is H or an N-protecting group; or acid addition salts thereof. The compounds of the present invention are useful as intermediates for the preparation of renin inhibiting compounds.
615975
Kempf Dale John
Luly Jay Richard
Plattner Jacob John
Abbott Laboratories
Goudreau Gage Dubuc
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