Photosensitive polymers

Details Photosensitive polymers Photosensitive polymers

C - Chemistry, Metallurgy

07

C

96/215, 402/257,

C07C 50/34 (2006.01) C07C 69/54 (2006.01) C08F 20/30 (2006.01) C08F 220/30 (2006.01) G03F 7/038 (2006.01)

Patent

CA 1224780

- 1 - Photosensitive polymers Abstract Novel photosensitive polymers having an intrinsic viscosity [?] of not less than 0.10 d1/g, measured at 25°C in N,N-dimethylformamide, and consisting of 1 to 40 mol % of recurring structural elements of the formula I Image (I) and 60 to 99 mol % of recurring structural elements of the formula II Image (II) in which R, R', R", X, Z and Z1 are as defined in patent claim 1, are described. The polymers according to the invention can be partially complexed with metal ions of a metal of group VIII or Ib of the periodic table. In -2- not less than 20% of the structural elements of the for- mula II, Z1 is -COO-C2-12-alkylene-OH, -COO(CH2CH2O)p H, -COO[CH2CH(CH3)O]p H, hydroxymethylphenyl, -CONH-C1-4- alkylene-OH or -COO-C1-4-alkylene-N(Q')(Q"), where p = 2-4. The polymers according to the invention can be used, inter alia, for producing images, in particular for the construction of electrically conductive coatings or patterns.

416435

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