Photosensitive resinous composition

Details Photosensitive resinous composition Photosensitive resinous composition

G - Physics

03

C

96/172

G03C 1/70 (1985.01)

Patent

CA 1214677

Abstract of the Disclosure A water developable photosensitive resin composition comprising wat soluble polymer, photopolymerizable unsaturated monomer(s) and photopolymerization initiator, which is characterized in that as th whole or a part of said photopolymerizable unsaturated monomer(s), use is made of the product made by mixing of 1 mole of urea, thiour or alkyl derivative thereof and 0.75 to 1.3 moles of N-alkylol acry amide or N-alkylol methacrylamide. The composiLion is useful for th image formation through photopolymerization reaction and developabl by a water treatment , giving soft and rubber li.ke resilience cured product.

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