C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/328, 260/357
C07D 335/02 (2006.01) A01N 43/02 (2006.01) A01N 43/14 (2006.01) C07D 309/32 (2006.01) C07D 409/04 (2006.01)
Patent
CA 1327591
ABSTRACT OF THE DISCLOSURE: Tetrahydro(thio)pyran-2,4-dione derivatives of the formula Image (I), where R1 is hydrogen, a cation, alkylcarbonyl, C2-C10-alkenylcarbonyl, or benzoyl which is unsubstituted or substituted by alkyl, R2 is alkyl, R3 is a non-aromatic, unsubstituted or alkyl-substituted heterocyclic compound of 5 to 7 ring members and having at most one double bond in the heterocyclic ring, X is oxygen or sulfur, and Z is oxygen or the radical NO -R4, R4 denoting alkyl, alkenyl, alkynyl, haloalkyl, haloalkenyl, alkoxyalkyl or the radical CH2-R5, where R5 is a heterocyclic compound of 5 ring members and containing from 1 to 3 hetero-atoms and from 0 to 2 double bonds and bearing either no substituents or one or two substituents selected from the group consisting of alkyl, alkoxy, halogen, tri- fluoromethyl, alkoxymethyl, alkylthiomethyl and vinyl, or R5 is phenyl which is unsubstituted or bears from one to three substituents selected from the group consisting of alkyl, alkoxy, halogen, trifluoromethyl, nitro and dialkylamino, and their use for combating unwanted plant growth and for regulating plant growth.
556426
Jung Johann
Kast Juergen
Keil Michael
Kolassa Dieter
Meyer Norbert
Basf Aktiengesellschaft
Robic
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