C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
167/23, 260/292,
C07C 211/35 (2006.01) A01N 33/04 (2006.01) A01N 33/08 (2006.01) A01N 43/84 (2006.01) C07D 211/26 (2006.01) C07D 295/00 (2006.01) C07D 295/033 (2006.01) C07D 295/096 (2006.01)
Patent
CA 1296729
ABSTRACT OF THE DISCLOSURE: Cyclohexylamines of the formula Image where X is a single bond or an alkylene chain, Y is hydrogen or an aryl, cyclohexyl, 4-cyclohexylcyclohexyl, perhydro-1- or 2-naphthyl or piperidyl radical, R1 and R2 are hydrogen, alkyl, alkenyl, alkynyl, hydroxyalkyl, cycloalkyl, cycloalkenyl or arylalkyl, or R1 and R2 together form an alkylene group and, together with the N atom, form a ring, and acid addition salts thereof, with the exception of compounds in which X is a single bond, Y is cyclohexyl, R1 and R2 are hydrogen or methyl, and the compounds in which X is C6-, C7- and C8-alkyl, Y is hydrogen and R1 and R2 together with the N atom whose substituents they are form a 2,6--dimethyl- morpholine radical, and fungicides containing such cyclohexylamines.
552126
Ammermann Eberhard
Buschmann Ernst
Goetz Norbert
Pommer Ernst-Heinrich
Schirmer Ulrich
Basf Aktiengesellschaft
Robic
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