C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/550.8
C07C 255/59 (2006.01) C07C 251/22 (2006.01) C07C 323/63 (2006.01)
Patent
CA 1333618
Novel compounds of the formula: Image where R is hydrogen, lower alkyl, lower alkoxy, lower alkylthio, hydroxy or halogen n is 0, 1 or 2, provided that when n is 2, the R substituents combined contain no more than 6 carbon atoms; and B is a carbon-carbon bond, lower alkylene, lower alkenylene, lower alkylene containing one Image ether or thioether link in the alkylene chain, or are useful as intermediates for preparing certain substitued di-t-butyl phenols used as anti-allergic agents.
615812
Riker Laboratories Inc.
Robic
LandOfFree
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