C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/101, 260/104
C07D 501/20 (2006.01) C07D 277/20 (2006.01)
Patent
CA 1209125
ABSTRACT OF THE DISCLOSURE Cephem compounds of the formula: (I) Image wherein R1 is carboxy(lower)alkyl or protected carboxy- (lower)alkyl, R2 is carboxy or protected carboxy, R3 is hydrogen or lower alkyl, and R4 is lower alkyl, lower alkoxy, acyloxymethyl, lower alkylthiomethyl, lower alkoxy- methyl, halogen, lower alkenyl or hydrogen, and pharmaceutically acceptable salts thereof, and processes for their preparation are provided, the compounds are active against a number of pathogenic microorganisms.
408563
Takasugi Hisashi
Takaya Takao
Yamanaka Hideaki
Fujisawa Pharmaceutical Co. Ltd.
Marcoux & Sher Swabey Mitchell Houle
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