C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/232, 260/279
C07D 401/12 (2006.01) C07D 307/83 (2006.01) C07D 405/12 (2006.01) C07D 409/12 (2006.01)
Patent
CA 1243320
ABSTRACT OF THE DISCLOSURE Bicyclic phenol ethers of the formula (I):- Image (I) wherein R1 is a hydrogen atom or a lower alkyl radical, R2 is a hydrogen atom or an acyl radical, X is an oxygen or sulphur atom or an -NH- group, Y is a -CO-CHR3- group or a -CO-C=CR4R5 group, R3 is a hydrogen atom, a lower alkyl radical, which can optionally be substituted by an aryl radical, or a cycloalkyl radical containing 3 to 7 carbon atoms and R4 and R5, which can be the same or different, are hydrogen atoms, lower alkyl radicals, alkenyl radicals containing 2 to 16 carbon atoms, which can optionally be substituted by an aryl radical, or an aryl radical or R4 and R5, together with the carbon atom to which they are attached, form a cycloalkyl ring con- taining 3 to 7 carbon atoms, and pharmaceutically accept- able, pharmacologically compatible salts thereof have an inhibiting action on anaphylactic reactions of the skin and of the bronchial system, even when administered orally in low dosages.
422393
Friebe Walter-Gunar
Kampe Wolfgang
Roesch Androniki Nee Apostolides
Schaumann Wolfgang
Boehringer Mannheim G.m.b.h.
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
LandOfFree
Anti-allergy bicyclic phenol ethers does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Anti-allergy bicyclic phenol ethers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Anti-allergy bicyclic phenol ethers will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1216996