Negative photoresist based on polyphenols and selected epoxy...

Details Negative photoresist based on polyphenols and selected epoxy... Negative photoresist based on polyphenols and selected epoxy...

C - Chemistry, Metallurgy

07

D

96/177, 260/369,

C07D 303/12 (2006.01) C07D 303/34 (2006.01) C08G 59/62 (2006.01) G03F 7/038 (2006.01)

Patent

CA 1328883

Negative photoresist based on polyphenols and selected epoxy or vinyl ether compounds Abstract The present invention relates to a negative photoresist essentially com- prising a) at least one solid, film-forming polyphenol, b) at least one polyfunctional epoxy resin and/or one polyfunctional vinyl ether compound, each of which can be dissolved, in the uncured state, in aqueous alkaline media with salt formation, c) at least one cationic photoinitiator for component b) and d) customary additives, if desired. Components a) and b) can also be combined in one molecule. The resist can be developed in aqueous alkaline media.

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