C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/241.1, 260/2
C07D 487/04 (2006.01) C07D 498/04 (2006.01) C07D 513/04 (2006.01)
Patent
CA 1169858
Abstract The lnvention relates to dibenzazepine derivatives of formula (I) Image (I) and the prsparation and use thereof. In formula (I), R1, R2, R3 and R4 represent hydrogen or halogen, or an alkyl or alkoxy group, each with 1 to 6 carbon atoms, R5 represents hydrogen, alkyl with 1 to 6 carbon atoms or alkenyl with 3 to 6 carbon atoms, R6 represents alkyl with 1 to 6 carbon atoms, alkenyl with 3 to 6 carbon atoms, a phenyl group optionally substituted by halogen, alkyl or alkoxy groups, or an optionally substituted phenylalkyl group witb the partial formula Image , wherein R1' and R2' may have the same meanings as. R1 and R2 but need not be identical to them, and n represents one of the integers from 0 to 4, X represents O, S or CH2, and the dotted line indicates the presence of either a single or a double bond. Compounds which have an asymmetric carbon atom may occur as racemates, as pure enantiomers or as mixtures containing differing proportions of the enantiomers. The compounds may occur in the form of the free bases or the acid addition salts. The new compounds have an anti-allergic, anti- histaminic and anti-serotonin activity and may therefore be used as medicaments.
410412
Fugner Armin
Schneider Claus
Walther Gerhard
Weber Karl-Heinz
Boehringer Ingelheim International Gmbh
Fetherstonhaugh & Co.
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