C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/279.2, 260/2
C07D 405/00 (2006.01) A61K 31/335 (2006.01) A61K 31/35 (2006.01) A61K 31/41 (2006.01) A61K 31/415 (2006.01) A61K 31/435 (2006.01) A61K 31/445 (2006.01) C07D 211/00 (2006.01) C07D 235/02 (2006.01) C07D 319/00 (2006.01) C07D 405/06 (2006.01) C07D 405/14 (2006.01) C07D 409/00 (2006.01) C07D 411/00 (2006.01) C07D 411/06 (2006.01) C07D 411/14 (2006.01)
Patent
CA 1175432
- 1 - HOE 81/F 145 Abstract of the disclosure: Compounds of the formula I Image (I) in which n denotes one, two or three; p and q denote integers from one to three, (p+q) being the number four; Ph denotes unsubstituted 1,2-phenylene or 1,2-phenylene which carries one to three identical or different and independent substituents, possible substituents being straight-chain or branched alkyl with 1 to 6 carbon atoms, alkoxy with 1 to 4 carbon atoms, alkylenedioxy with 1 or 2 carbon atoms,halogen, trifluoromethyl, nitro or alkan- oyl with 1 to 3 carbon atoms; R1 and R2 are identical or different and independent, and denote hydrogen or alkyl with 1 to 5 carbon atoms; R3 and R4 are identical or different and independent, and denote hydrogen or alkyl with 1 to 5 carbon atoms, or R3 and R4 together denote PH' (as defined for Ph) or together denote straight-chain or branched alkylene with 1 to 5 carbon atoms; R5 denotes hydrogen, alkyl with 1 to 5 carbon atoms, or phenyl which is optionally monosubstituted or disubstituted by straight- chain or branched alkyl with 1 to 6 carbon atoms, alkoxy with - 2 - 1 to 4 carbon atoms, alkylenedioxy with 1 or 2 carbon atoms, halogen, trifluoromethyl, nitro or alkanoyl with 1 to 3 carbon atoms; X denotes an oxygen or sulfur atom, imino or alkylimino with 1 to 4 carbon atoms; and Y denotes an oxygen or sulfur atom or a sulfinyl group are described. Processes for the preparation of these compounds are also described. The compounds are useful as medicaments, by antipsychotic actions.
405525
Gerhards Hermann
Henning Rainer
Lattrell Rudolf
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Hoechst Aktiengesellschaft
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