C - Chemistry – Metallurgy – 08 – J
Patent
C - Chemistry, Metallurgy
08
J
400/5328
C08J 7/00 (2006.01)
Patent
CA 1252590
METHOD FOR SUPPRESSING THE GENERATION OF HYDROGEN GAS FROM CURED SILICONE MATERIALS Abstract Contacting cured addition-type cured silicone material with hydrogen gas suppressing materials which are compounds containing phosphorus, sulfur, nitrogen, or aliphatic unsaturation reduces or eliminated the undesirable hydrogen gas generation. Examples of such hydrogen gas suppressing materials are triethylphosphine, .gamma.-mercaptopropyltrimethoxysilane, N,N-diethylaminoethanol, 3-methyl-1-butyne-3-ol, and Image
484752
Gowling Lafleur Henderson Llp
Toray Silicone Company Ltd.
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