C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/233, 260/313
C07D 233/61 (2006.01) A61K 31/41 (2006.01) C07D 249/08 (2006.01) C07D 303/22 (2006.01) C07D 521/00 (2006.01)
Patent
CA 1249282
ABSTRACT An antimycotic agent, comprising a compound of the formula Image in which R 1 is hydrogen, alkyl, optionally substituted phenyl or optionally substituted benzyl, R2 is hydrogen, alkyl, alkenyl, alkinyl, optionally substituted phenyl or optionally substituted benzyl, R3 and Y each independently is halogen, alkyl, cycloalkyl, alkoxy, alkylthio, halogenoalkyl, halogenoalkoxy, halogenoalkylthio, optionally substituted phenyl, optionally substituted phenoxy, optionally substituted phenylalklyl or optionally substituted phenoxyalkyl, R4 and R5 each independently is alkyl, X is a nitrogen atom or the CH group, m is 0, 1, 2 or 3, n i s 1 or 2, and p is 0, 1 or 2, or an acid addition salt thereof.
486162
Buchel Karl H.
Elbe Hans-Ludwig
Plempel Manfred
Schaller Klaus
Stetter Jorg
Aktiengesellschaft Bayer
Fetherstonhaugh & Co.
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