Polyacetylenic lipids, radiation-sensitive compositions,...

Details Polyacetylenic lipids, radiation-sensitive compositions,... Polyacetylenic lipids, radiation-sensitive compositions,...

C - Chemistry, Metallurgy

07

F

96/175, 96/219,

C07F 9/10 (2006.01) A61K 9/127 (2006.01) C08F 38/00 (2006.01) C11C 3/00 (2006.01) G03F 7/025 (2006.01)

Patent

CA 1181759

Abstract of the Disclosure A photopolymerizable monomer comprising a lipid having at least one hydrophobic acyl chain containing at least two conjugated acetylenic linkages is useful in preparing radiation-sensitive compositions and photo- graphic elements comprising a plurality of liposomes. Further, processes for photopolymerizing the radiation- sensitive compositions and for forming an image in the photographic elements comprise exposing the lipid to radiation, heating the lipid to a temperature equal to or above a first transition temperature of the lipid to render it insensitive to further exposure, and optionally cooling the lipid to a temperature equal to or below a second phase transition temperature of the lipid to render it again sensitive to further exposure. The monomeric lipids, when photopolymerized, form polymeric lipids exhibiting different solubility and liposome wall permeability as compared to the unpolymerized monomeric lipids,

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