C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
402/320, 402/38,
C08G 65/48 (2006.01) C08G 59/04 (2006.01) C08G 75/23 (2006.01) C08L 71/00 (2006.01)
Patent
CA 1318449
K-16872/+ Polyether sulfone or polyether ketone copolymers Abstract of the Disclosure The invention relates to copolyether resins having and groups -OR1 linked direct to phenyl nuclei and containing 1 to 50 mol% of repeating struc- tural units of formula I Image (I), and 99 to 50 mol% of repeating structural units of formula II Image (II), wherein Rl is hydrogen, a phenylene radical substituted by amino groups or ethylenically unsaturated radicals or is a 2,3-epoxypropyl radical, R2 is a direct C-C bond or a group of formula -CrH2 -, -O-, -S-, -CO- or -SO2-. r is 1 to 20, R3 is hydrogen or methyl, R4, R5 and R7 are inert substituents, m, n and o are each independently O, 1 or 2, p is 1 or 2, R6 is a radical of a bisphenol, X and Y are -SO2- or -CO-. The compounds can be used in particular in conjunction with unsaturatedimides as matrix resins for the preparation of fibrous composite structures.
589490
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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