C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
96/174, 402/2
C08G 73/10 (2006.01) G03C 11/08 (2006.01) G03F 7/038 (2006.01)
Patent
CA 1271584
Homopolymers, copolymers and coated material and its use Abstract Homopolymers and copolymers which have an average molecular weight of at least 2000 and which contain at least 5 mole %, relative to the polymer, of at least one structural element of the formula I or II Image (I) Image (II), in which R1 is halogen, nitro or C1-C6-alkyl, C1-C6-alkoxy or C1-C6- alkylthio each of which can be substituted by phenyl, or is phenyl, phenoxy or phenylthio, R2 is a direct bond or a bridge group, R3 is a hydrogen atom or aroyl or is as defined for R1, a is 0, 1, 2 or 3, b is 0, 1, 2, 3 or 4, c and d are 0, 1, 2, 3, 4 or 5 and q is 0 or 1, and if a, b and d are 2, then the two R1s can be attached in the o-position and together can be -CH=CH-CH=CH-, and R and R' are an unsubstituted or a hydroxy-, halide- or alkoxy-substituted divalent aliphatic radical which can be interrupted by hetero-atoms or by aromatic, heterocyclic or cycloaliphatic groups, or are an unsubstituted or an alkyl-unsub- stituted cycloaliphatic radical or an unsubstituted araliphatic radical, an aromatic radical in which two aryl nuclei are linked via an aliphatic group, or an aromatic radical which is substituted by at least one alkyl group, cycloalkyl group, alkoxy group, alkoxyalkyl group, alkylthio group, alkylthioalkyl group or aralkyl group, or two adjacent C atoms of the aromatic radical are substituted by an alkylene group, provided that, if q is 0, then R is an aromatic radical which is substituted in the two ortho-positions relative to at least one N atom or R is an aromatic radical wherein two adjacent C-atoms are substituted by alkylene. The polymers are sensitive to radiation and can be used for the production of protective coatings or photographic relief images.
481558
Ciba-Geigy Investments Ltd.
Fetherstonhaugh & Co.
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