C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/324, 260/479
C07C 69/743 (2006.01) A01N 53/00 (2006.01) C07D 307/93 (2006.01) C07D 333/32 (2006.01)
Patent
CA 1248117
PRECIS DE LA DIVULGATION: L'invention concerne les composés de formule générale (I): Image (I) où R2 est un radical cyano ou éthynyle et R3 est un reste d'acide cyclopropane carboxylique substitué. L'invention concerne également la préparation des composés (I) et leur application dans la lutte contre les parasites.
401065
Demoute Jean-Pierre
Martel Jacques
Tessier Jean
Aventis Cropscience S.a.
Robic Robic & Associes/associates
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