C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/208, 260/251
C07D 239/47 (2006.01) C07D 239/46 (2006.01) C07D 239/95 (2006.01) C07D 401/12 (2006.01) C07D 405/00 (2006.01) C07D 405/12 (2006.01)
Patent
CA 1247096
A B S T R A C T Compounds of the formula (I) : Image (I) and salts are histamine H2-antagonists, wherein : R1 and R2 are hydrogen, or various substituted alkyl groups; n is 1 to 6; Z is 2,5-furanyl, 2,5-thienyl, 2,4-pyridyl (wherein R1R2N(CH2)n is at position 4) or 1,3 or 1,4- phenylene; m is zero or one; Y is oxygen, sulphur or methylene; p is two to four; X is oxygen or sulphur; and R3, R4 and R5 are hydrogen or alkyl, or R3 and R4 together with the carbon atoms to which they are attached form a benzene ring optionally substituted by alkyl. Pharmaceutical compositions containing them are described as are processes for their preparation and intermediates therefor.
457964
Gowling Lafleur Henderson Llp
Smith Kline & French Laboratories Limited
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