C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/270
C07D 451/04 (2006.01)
Patent
CA 1167443
ABSTRACT Compounds of the formula (I) and pharmaceutically acceptable salts thereof: Image (I) wherein: R1 is C1-6 alkyl; R2 is hydrogen or C1-7 acyl; R3 is C1-6 alkyl; R4 is a group CH2R5 wherein R5 is hydrogen, C3-8 cycloalkyl or phenyl optionally substituted by one or two substituents selected from C1-6 alkyl, C1-4 alkoxy, trifluoromethyl and halogen, having useful anti-emetic activity.
392126
Beecham Group Limited
Borden Ladner Gervais Llp
LandOfFree
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