Apparatus for uniformly heating a substrate

Details Apparatus for uniformly heating a substrate Apparatus for uniformly heating a substrate

H - Electricity

01

L

126/1, 345/22

H01L 31/06 (2006.01) C23C 16/48 (2006.01) H05B 3/00 (2006.01)

Patent

CA 1189602

ABSTRACT Apparatus for developing a substantially uniform temperature distribution across the entire transverse width of a relatively thin, relatively large area substrate onto which a plurality of amorphous semiconductor layers will be deposited in a glow discharge deposition chamber. The ap- paratus includes a plurality of spaced heating elements, the filaments of which are suspended above and angled relative to the plane of the substrate so as to direct radiation onto that portion of the substrate which loses heat at the greatest rate with at least the same intensity as, and preferably greater intensity than, radiation is directed onto those portions of the substrate which lose heat at lesser rates. By establishing the greatest intensity of radiation adjacent that portion of the substrate which most readily loses heat, a uniform distribution of temperature across the transverse width of the substrate may be achieved.

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