Method of eliminating a fern-like pattern during...

Details Method of eliminating a fern-like pattern during... Method of eliminating a fern-like pattern during...

C - Chemistry, Metallurgy

25

D

204/15

C25D 7/06 (2006.01) C25D 5/36 (2006.01)

Patent

CA 1329915

Abstract of the Disclosure A method is provided for eliminating a fern-like pattern on metal strip being electroplated with metal or metal-alloy coatings. The method includes contacting the to be plated surface of the strip with sufficient additional electrolyte solution to substantially eliminate non-uniformity of a film carried thereon from a prior treatment, such additional electrolyte being in contact with said surface for at least 0.1 second prior to and continuing until arrival of said surface at a point directly facing the adjacent edge of a first electrically energized anode within an electrolytic cell for the plating thereof.

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