C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
400/7077, 260/27
C07D 498/10 (2006.01) C07D 498/20 (2006.01) C07D 519/00 (2006.01) C08K 5/35 (2006.01)
Patent
CA 1262900
Abstract of the disclosure: New polyalkyldiazaspirodecanylacetic acid deriva- tives are prepared by reacting diazaspirodecanes of the formula Image in which X is = Image , with halogenoacetic acid derivatives, and, if desired, reacting products thus obtained further with alcohols or amines. The compounds can be used as light stabilizers for plastics and lacquers.
427873
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Hoechst Aktiengesellschaft
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