C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/219, 260/242
C07D 471/14 (2006.01) A61K 31/505 (2006.01)
Patent
CA 1252093
Abstract of the Disclosure The invention relates to novel quinazoline compounds of formula Image (I) wherein R1 and R2, which may be the same or different, represent hydrogen atoms, or lower alkyl or lower alkoxy groups; and/or of R1 and R2, when in the 8-position as shown in formula (I), may represent a halogen atom; and/or one of R1 and R2 may represent a fused benzene ring; R3 and R4, which may be the same or different, represent hydrogen atoms, or lower alkyl or lower alkoxy groups; and/or one of R3 and R4 may represent a halogen atom in the 2-, 3- or 4- position as shown in formula (I); and/or one of R3 and R4 may represent a fused benzene ring; one of the pairs of groups R1 and R2, or R3 and R4, being situated on adjacent carbon atoms and together representing a group -N=N-NH-; together with the addition salts thereof. The compounds are potentially valuable pharmaceutical compounds and are of special interest in the prevention and treatment of allergic conditions such as asthma, hay fever, conjunctivitis, urticaria, eczemas and atopic dermatitis. They can also have a muscle-relaxing (broncho-dilatory) and vasodilatory effect.
444824
Fugner Armin
Mentrup Anton
Renth Ernst-Otto
Schromm Kurt
Boehringer Ingelheim International Gmbh
Fetherstonhaugh & Co.
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