Process for the formation of images using a composition...

Details Process for the formation of images using a composition... Process for the formation of images using a composition...

G - Physics

03

F

96/219

G03F 7/004 (2006.01) C08G 59/68 (2006.01)

Patent

CA 1183038

PROCESS FOR THE FORMATION OF IMAGES ABSTRACT A layer of a photoresist composition on a substrate is exposed imagewise to actinic radiation, as through a negative, the photoresist composition comprising an epoxide resin, a benzenoid polyamine, and an aromatic compound which liberates an acid on exposure to actinic radiation. The composition is then heated such that where the radiation has struck the composition local curing of the epoxide resin takes place, the liberated acid acting as accelerator in the curing by the benzenoid polyamine. In parts not struck by radiation the acid accelerator is not liberated and so curing (and insolubilisation of the epoxide resin in solvents) takes place much more slowly. By treatment with a suitable solvent unirradiated (and hence uncured) portions of the compositions are dissolved away, an image being formed on the substrate.

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