Photopolymer process and composition employing a...

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G - Physics

03

C

96/150, 402/372,

G03C 5/16 (2006.01) C08F 2/50 (2006.01) G03F 7/027 (2006.01) G03F 7/031 (2006.01)

Patent

CA 1243447

PHOTOPOLYMER PROCESS AND COMPOSITION EMPLOYING A PHOTOOXIDIZABLE COMPONENT CAPABLE OF FORMING ENDOPEROXIDES Abstract of the Disclosure The photosensitive composition of this invention contains (1) an ethylenically unsaturated component capable of forming a high polymer by addition polymerization or crosslinking, (2) a cyclic cisoid conjugated diene as a photooxidizable component capable of reacting with singlet oxygen to form an endoperoxide, and (3) a photcoxygenation sensitizer. A process for preparing a photosensitive element, such as a relief printing plate, embodying a layer of such a composition is described.

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