H - Electricity – 01 – L
Patent
H - Electricity
01
L
356/182, 148/2.1
H01L 21/205 (2006.01) C23C 16/24 (2006.01) C23C 16/452 (2006.01) C30B 33/08 (2006.01)
Patent
CA 1333041
A process for forming deposited film, which comprises: (a) the step of preparing a substrate having crystal nuclei or regions where crystal nuclei are selectively formed scatteringly on the surface for forming deposited film in a film forming space for formation of deposited film; (b) the step of forming deposited film on the above substrate by introducing an activated species (A) formed by decomposition of a compound (SX) containing silicon and a halogen and an activated species (B) formed from a chemical substance for film formation (B) which is chemically mutually reactive on said activated species (A) separately from each other into said film-forming space to effect chemical reaction therebetween; (c) the step of introducing a gaseous substance (E) having etching action on the deposited film to be formed or a gaseous substance (E2) forming said gaseous substance (E) into said film-forming space during said film-forming step (b) and exposing the deposited film growth surface to said gaseous substance (E) to apply etching action thereon, thereby effecting preferentially crystal growth in a specific face direction; (d) irradiating said gaseous substance (E) with light energy during said step (c), and (e) the step of increasing etching activity of said gaseous substance (E) by irradiation of light energy.
534572
Canon Kabushiki Kaisha
Ridout & Maybee Llp
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