Method for preparation of multi-layer structure film

Details Method for preparation of multi-layer structure film Method for preparation of multi-layer structure film

C - Chemistry, Metallurgy

23

C

345/26, 117/85

C23C 16/22 (2006.01) C23C 16/452 (2006.01) H01L 21/205 (2006.01)

Patent

CA 1323528

ABSTRACT OF THE DISCLOSURE A method for preparing a multi-layer structure film by forming a deposited film according to the chemical vapor deposition method comprises introducing a subjective starting material gas (A) which is the major flow rate component and an objective starting material gas (B) which is the minor flow rate component and hydrogen externally activated into a reaction space and controlling periodically the amount of said objective starting material gas (B) introduced to thereby form a deposited film with a multi-layer structure.

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