Imidazole derivatives, processes for their manufacture and...

Details Imidazole derivatives, processes for their manufacture and... Imidazole derivatives, processes for their manufacture and...

C - Chemistry, Metallurgy

07

D

260/260, 260/305

C07D 233/84 (2006.01) C07C 381/00 (2006.01) C07D 233/54 (2006.01) C07D 401/00 (2006.01) C07D 403/00 (2006.01)

Patent

CA 1169063

ABSTRACT The invention provides a compound of the general formula Image (I), in which Ar1 and Ar2, which may be the same or different, each represents a phenyl radical, unsubstituted or substituted by one or more of the same or different substituents selected from halogen atoms, alkyl radicals, alkoxy radicals and dialkylamino radicals: a pyridyl radical; a furyl radical; or a thienyl radical; R1 represents a hydrogen atom; an alkyl radical having from 1 to 6 carbon atoms which is unsubstituted or substituted by one or more of the same or different substituents selec- ted from hydroxy groups, alkoxy radicals and acyloxy radicals, a benzyl radical: a tetrahydropyran-2-yl radical; or a tetrahydrofuran-2-yl radical; n represents 0, 1 or 2, and Z represents a phenyl, pyridyl, N-oxidopyridyl, pyrimidinyl, thiazolyl or thienyl radical, each of which is unsubstituted or substituted by one or more of the same or differet substituents selected from halogen atoms, alkyl radicals, alkoxy radicals, nitro groups, amino groups, mono- and di-alkylamino radicals, acylamino radicals and trifluoromethyl groups, and salts thereof. These compounds can be used for treating inflammatory or allergic disorders or for treating migraine or dysmenorrhea.

380977

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