Photo-mechanically reproduced blasting mask and method of...

G - Physics – 03 – F

Patent

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51/2, 96/210, 96

G03F 7/12 (2006.01) B24C 1/00 (2006.01)

Patent

CA 1219762

ABSTRACT OF THE DISCLOSURE A blasting mask and method of making and using same are provided The blasting mask can comprise a thin backing sheet of polyester, preferably Mylar, and a layer of polymerizable material affixed to the backing sheet and being of a predetermined size and shape. The blasting mask is preferably made by photograph- ing a shape to be reproduced to form a negative. A blasting mask blank is then provided which comprises a backing sheet and a uniform layer of polymerizable material thereon. Ultraviolet light is shined through the negative onto the blasting mask blank which polymerizes the material from a monomer to a polymer in the areas where it receives the ultraviolet light to cause it to harden. The remaining material is washed away to leave bare spaces on the backing sheet. The resulting blasting mask is adhered to grit-erodible material in which the shape is to be reproduced, and blasting grit is directed toward the grit-erodible material for a sufficient time to erode the erodible material to a desired depth. The blasting mask can be placed on the grit-erodible material with the backing sheet contiguous with the material or with the hardened material contiguous with the grit-erodible material. In the latter instance, the hardened material can be adhered to the grit-erodible material and the backing sheet peeled away from the hardened ma- terial. -2-

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