Multiple vacuum arc derived plasma pinch x-ray source

Details Multiple vacuum arc derived plasma pinch x-ray source Multiple vacuum arc derived plasma pinch x-ray source

H - Electricity

01

J

356/147, 358/24

H01J 35/00 (2006.01) G03F 7/20 (2006.01) H05G 1/00 (2006.01) H05G 2/00 (2006.01)

Patent

CA 1239487

TITLE MULTIPLE VACUUM ARC DERIVED PLASMA PINCH X-RAY SOURCE INVENTORS Rajendra P. Gupta Mladen M. Kekez John H. Lau Gary D. Lougheed ABSTRACT OF THE DISCLOSURE With the intent of satisfying the requirement of x-ray lithography a plasma pinch x-ray source has been developed in which the initial plasma annulus is derived from a plurality of electrical arcs in vacuum. This gives a low mass liner for the standard imploding plasma liner configuration to emit suitable x-rays and has the capabi- lity of being fired at repetition rates of 10 pps or more. The sim- plicity of this source design is especially attractive for a commercial use environment.

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