G - Physics – 01 – N
Patent
G - Physics
01
N
356/176, 356/192
G01N 21/86 (2006.01) G03F 7/20 (2006.01)
Patent
CA 1269765
Abstract: The present invention relates to a method and apparatus for defining fine-line features on a wafer. The method comprises the steps of generating narrow-bandwidth laser pulses and directing the pulses via a lens and scanning assembly to form a variable-size variable-shape virtual source composed of the multiple pulses. The method further includes relaying the virtual source through a reticle pattern to illuminate a substantial portion of the entrance pupil of a diffraction-limited low-loss projection lens made of a single optical material, and directing the reticle pattern via the projection lens onto the surface of the wafer. The apparatus comprises a laser that inherently is characterized by a relatively wide bandwidth and a lens assembly disposed in the path of radiation from the laser which exhibits unacceptably large chromatic aberrations in response to the relatively wide bandwidth. A unit is provided for sufficiently narrowing the bandwidth of the radiation to cause the assembly to exhibit acceptably low chromatic aberrations.
579702
American Telephone And Telegraph Company
Kirby Eades Gale Baker
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